Just Add Water: Immersion Lithography at 193 nm
The predominant form of manufacturing in the integrated circuit industry is photolithography, the process by which images are written with light. Throughout the years, the resolution of photolithography has been improved by shortening the exposure wavelength and improving the optics. Immersion lithography is a technique that aims to improve the resolution of existing systems by using liquids with a high index of refraction. However, challenges remain, as bubble formation is a serious threat to image quality in immersion systems. Nevertheless, with sufficient engineering refinement, immersion lithography represents a way to extend the lifespan of optical lithography even further.